Director of the Center for Integrated Electronics
Professor of Materials Science and Engineering
Professor of Chemistry
Rensselaer Polytechnic Institute
Ph.D., Chemistry, University of British Columbia, Vancouver,
M.S., Chemistry, University of Hyderabad, India, 1980
B.S., Chemistry and Biology, Osmania University, India, 1978
Before joining Rensselaer in 2002, Nalamasu held several key
research and development leadership positions in AT&T
Bell Laboratories, Bell Laboratories/Lucent Technologies,
and Agere Systems in Murray Hill, N.J. He previously served
as director of Bell Laboratories' Nanofabrication Research
Laboratory in Murray Hill. At Bell Labs and Agere, Nalamasu
was a representative to the SEMATECH Lithography Technical
Working Group, Focus Technical Advisory Board, and Resist
In 2003, Nalamasu received the NYSTAR
(New York State Office of Science, Technology, and Academic
Research) Distinguished Professor Award along with a $1 million
grant from the Faculty Development Program. Nalamasu has earned
several other prestigious awards, including the American Chemical
Society (ACS) National Award for Team Innovation for the Invention
and Innovation of 193 nm (nanometer) Resist Material in 2000
and Japan's Photopolymer Science and Technology Award in 1998.
He and his technical team also won an R&D 100 Award for
Invention, Development, and Commercialization of the first
Deep-UV (ultraviolet) Chemically Amplified Photoresist (CAMP)
Nalamasu has published more than 170
papers, review articles, and book chapters; he has received
eleven patents and edited two books. He also has organized
and presented several invited and plenary talks at national
and international conferences, including one by invitation
for the National Academy of Engineering's 4th Annual Symposium
on the Frontiers of Engineering in 1998.
In addition to his Rensselaer center
directorship, Nalamasu is the chief technical officer of the
New Jersey Nanotechnology Consortium, a public/private nonprofit
enterprise he co-founded to foster nanotechnology partnerships
across academia, industry, and government.
Nalamasu's primary research interests are in the areas of
nanotechnology, nanopatterning, electronic and photonic materials,
and lithography with special emphasis on applying patterning
and materials know-how for device fabrication. He is also
interested in MEMs technology and its utility in combination
with nanotechnology for developing novel sensors and devices.
Nalamasu has made seminal contributions
to the fields of optical lithography and polymeric materials
science and technology. His pioneering contributions to optical
lithography and photoresist materials science and technology
have played a major role in enabling the microelectronics
revolution, especially where this technology helped extend
the boundaries of optical lithography for patterning sub-100
nm design rule devices. His contributions to the fundamental
understanding of the structure-property relationships between
molecular structure of resist components and their relation
to resist properties, as well as his contributions to resist
materials chemistry and process development have played a
defining role in identifying novel resist materials and chemistries
required for implementation of deep-UV, 193 nm, and e-beam
M.V. Kunavakkam, F.M. Houlihan, M. Schlax, J.A. Liddle, P.
Kolodner, J.A. Rogers, and O. Nalamasu, "Low-Cost, Low-Loss
Micro-Lens Arrays Fabricated by Soft-Lithography Replication
Process," in press, Applied Physics Letters, (2003).
S. Yang, P. Mirau, C.S. Pai, O. Nalamasu,
E. Reichmanis, J. Seputro, Y.S. Obeng, E. Lin, and H.J. Lee,
"Nanoporous Ultralow Dielectric Constant Organosilicates
Templated by Triblock Copolymers," Chemistry of Materials,
14, (1), 369-374, (2002).
E. Reichmanis and O. Nalamasu, "Testing
the Limits of Resists," Science, 297,
E. Reichmanis, O. Nalamasu, and F.M. Houilhan,
"Photoresponsive Polymers: Applications in Electronics,"
in Encyclopedia of Physical Science and Technology,
S. Pau, G.P. Watson, and O. Nalamasu, "Writing
an Arbitrary Non-Periodic Pattern Using Interference Lithography,"
Journal of Modern Optics, 48,
O. Nalamasu, F.M. Houlihan, E. Reichmanis,
R. Cirelli, and A. Timko, "An Overview of the Role of
Materials Technology for 193 nm Lithography," Polymer
Material Science Engineering, 84,
E. Reichmanis and O. Nalamasu, "Polymer
Materials for Microelectronics Imaging Applications,"
in Applied Polymer Science, C.D. Craver, C.E. Carraher,
Eds., Elsevier, Oxford, 635-658, (2000).
G.P. Watson, I.C. Kizilyalli, O. Nalamasu,
R.A. Cirelli, M. Miller, Y.T. Wang, B. Pati, J. Radosevich,
R. Kohler, F. Klemens, W. Mansfield, H. Vaidya, A. Timko,
L.E. Trimble, and J. Frackoviak, "Implementing Advanced
Lithography Technology: A 100 MHz, 1 Volt Digital Signal Processor
Fabricated with Phase Shift Technology," Journal of
Vacuum Science and Technology B, 18,
E. Reichmanis, O. Nalamasu, and F.M. Houlihan,
"Organic Materials Challenges for 193 nm Imaging,"
Accounts of Chemical Research, 32,
(8), 659, (1999).
9023 Low Center for Industrial Innovation
Rensselaer Polytechnic Institute
Troy, N.Y. 12180
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